Zr(TMHD)4
Zr(TMHD)4 is the tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato) complex of zirconium, a white to off-white crystalline powder of 99% purity.
The four bulky β-diketonate ligands shield the metal centre and make the complex volatile and thermally stable enough to be transported in the gas phase, while remaining cleanly decomposable to zirconium oxide. This balance of volatility and stability is exactly what chemical vapour deposition and atomic layer deposition processes require.
The compound is moisture-sensitive and is supplied in sealed containers under inert gas; it should be kept dry and cool, away from water, acids and oxidising agents.
• Thin-film deposition: a volatile zirconium precursor for MOCVD and ALD of zirconia, zirconium silicate and lead zirconate titanate (PZT/PNZT) dielectric layers.
• Semiconductor manufacturing: used to grow high-k gate and capacitor dielectrics with good step coverage and low carbon contamination.
• Catalysis: applied as a soluble zirconium source for polymerisation catalysts and for the preparation of zirconia-supported catalysts.
• Nanomaterial synthesis: decomposes under controlled conditions to give zirconia nanoparticles, coatings and sol-gel derived mixed oxides.
Product Name: Zr(TMHD)4
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