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2-(1-adamantyl)butan-2-yl methacrylate

CAS No.:325991-26-2
Product Grade: Industrial Grade
Purity / Assay: ≥98.0%
Molecular Formula:‌C₁₈H₂₈O₂
Molecular Weight:276.41 g/mol
Synonym(s):adamantyl butyl methacrylate, 1-adamantyl tert-butyl methacrylate, adamantyl methacrylate (butan-2-yl ester)

2-(1-adamantyl)butan-2-yl methacrylate, identified by CAS 325991-26-2, is a high-performance specialty monomer characterized by its bulky adamantyl cage structure and a tertiary ester linkage. This chemical architecture provides exceptional structural rigidity and thermal stability, making it a critical building block in the synthesis of advanced polymers. The presence of the adamantyl group enhances the dry etch resistance of resulting materials, while the tertiary alkyl ester functionality introduces specific reactivity patterns, particularly under acidic conditions.

In industrial and research settings, this methacrylate derivative is primarily handled as a liquid or low-melting solid, requiring standard chemical safety protocols to prevent irritation or environmental exposure. Its unique combination of hydrophobicity and high carbon-to-hydrogen ratio makes it a preferred candidate for applications demanding precise control over polymer solubility and mechanical integrity. As a specialty monomer, it serves as a cornerstone for developing next-generation materials in microelectronics and high-tech manufacturing.

• This monomer is extensively utilized in the formulation of 193 nm (ArF) and Extreme Ultraviolet (EUV) photoresists for semiconductor manufacturing. The bulky adamantyl moiety significantly improves the plasma etch resistance of the photoresist film, allowing for the creation of high-aspect-ratio patterns with minimal degradation during the subsequent etching processes in microchip fabrication.

• The tertiary ester linkage in 2-(1-adamantyl)butan-2-yl methacrylate functions as an acid-labile protecting group. Upon exposure to a photoacid generator during lithographic processing, the ester undergoes acid-catalyzed deprotection, leading to a dramatic change in the polymer’s solubility. This mechanism is essential for achieving high-resolution, positive-tone imaging required for advanced integrated circuits.

• Beyond lithography, the compound is employed in the development of high-refractive-index optical materials and specialty coatings. Its rigid cyclic structure contributes to a high glass transition temperature (Tg) in copolymers, enhancing the thermal and mechanical durability of optical components used in precision sensors and display technologies.

• It serves as a versatile intermediate in polymer science research for creating hydrophobic, bulky, and thermally stable acrylic resins. Researchers leverage its unique steric hindrance to modify the polymerization kinetics and physical properties of functional coatings, enabling the design of materials with tailored surface energy and moisture resistance.

25kg/drum; 180kg/drum; 25kg/bag
CAS No.: 325991-26-2

Product Name: 2-(1-adamantyl)butan-2-yl methacrylate

Purity / Assay:≥98.0%
Molecular Formula:‌C₁₈H₂₈O₂
Molecular Weight:276.41 g/mol
Synonym(s):adamantyl butyl methacrylate, 1-adamantyl tert-butyl methacrylate, adamantyl methacrylate (butan-2-yl ester)

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