Dicyclopentanyl Methacrylate
Dicyclopentanyl Methacrylate, identified by CAS number 34759-34-7, is a specialty monofunctional monomer featuring a bulky, rigid alicyclic dicyclopentanyl group attached to a methacrylate backbone. This unique structure distinguishes it from conventional linear alkyl methacrylates, providing a high glass transition temperature and a high refractive index. It typically appears as a clear, low-viscosity liquid and is stabilized with inhibitors to ensure shelf-life stability during transport and storage.
In industrial and research settings, this monomer is prized for its ability to enhance the physical and thermal properties of copolymers. It offers excellent hydrophobic characteristics, low polymerization shrinkage, and superior resistance to environmental degradation. Because of its low volatility and high reactivity under standard polymerization conditions, it serves as a versatile building block for designing advanced materials that require a balance of mechanical toughness and optical clarity.
• In the electronics and optics industries, Dicyclopentanyl Methacrylate is utilized to manufacture high-refractive-index polymers and precision optical components. Its rigid structure contributes to high glass transition temperatures and excellent dimensional stability, which are critical for lenses, optical fibers, and display materials that must resist thermal deformation during processing.
• The monomer is widely incorporated into specialized coating formulations and resin systems to enhance weatherability and chemical resistance. Due to the hydrophobic nature of the dicyclopentanyl moiety, polymers containing this monomer exhibit superior water resistance and low moisture absorption, making them ideal for protective topcoats in automotive and aerospace environments.
• It serves as a key component in high-performance adhesives and UV-curable sealants. By adjusting the concentration of this monomer, formulators can fine-tune the mechanical strength and adhesion properties of the final product. Its low shrinkage during polymerization ensures better bond integrity and precision in structural bonding applications across various industrial sectors.
• This chemical is frequently employed in the synthesis of photoresist resins for semiconductor lithography. The alicyclic structure provides the necessary dry-etch resistance and sensitivity required for high-resolution patterning, helping to achieve the fine architectural details needed in modern microelectronics while maintaining structural robustness.
Product Name: Dicyclopentanyl Methacrylate
For global customers, we provide complete technical documentation to support product evaluation, regulatory compliance and safe handling during transportation and application.