Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate
This compound (CAS 258872-05-8), also abbreviated TBPDPS-PFBS, is a triarylsulfonium salt in which a diphenyl(4-tert-butylphenyl)sulfonium cation is paired with the nonafluorobutanesulfonate anion, sometimes written as (4-(tert-butyl)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate. It is a white to off-white solid that is thermally stable and soluble in the organic solvents used for photoresist formulations, and it is stored sealed and dry at room temperature at high purity. On exposure to deep ultraviolet light or an electron beam the sulfonium cation fragments to release the strongly acidic nonafluorobutanesulfonic acid, making the compound a photoacid generator with a highly fluorinated, low-diffusion anion. That low diffusion is essential for sharp, high-resolution patterning at modern semiconductor feature sizes.
1. Photoacid generator for photoresists: the primary application is in chemically amplified resists used for semiconductor and integrated-circuit lithography, where light-generated acid drives the deprotection reaction that defines the printed pattern.
2. Patterning and imaging materials: used in deep-ultraviolet and electron-beam resists and in photoinitiated cationic curing of coatings, adhesives, inks and three-dimensional printing resins.
3. Photoinitiator and catalyst chemistry: employed in radiation-curable epoxy and vinyl ether systems and as a latent acid source for photochemical, microelectronic and microfabrication processes requiring precise acid generation.
4. Handling and storage: store sealed in a dry, cool, dark place away from moisture, bases and reducing agents; the material is photoactive, so avoid unnecessary light exposure, and the persistent fluorinated anion requires controlled waste disposal in line with environmental regulations.
Product Name: Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate
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