Tetraethoxysilane (CAS: 78-10-4), commonly TEOS, is a silicon alkoxide precursor that hydrolyzes and condenses in the presence of water to form high-purity silica. This colorless liquid serves as the premier precursor for sol-gel silica coatings, silica aerogels, and optical fibers where ultra-high purity and controlled porosity are essential. In semiconductor manufacturing, TEOS enables chemical vapor deposition of silicon dioxide dielectric layers for integrated circuits. The coatings industry employs it for abrasion-resistant sol-gel finishes on glass, plastic, and metal substrates, while the investment casting industry uses silica sols derived from TEOS for precision ceramic shells. It also functions as a cross-linker in silicone systems and as a precursor for mesoporous silica materials in catalysis research. With its controlled reactivity and exceptional purity capabilities, TEOS is fundamental to advanced glass, electronics, and ceramic technologies.
Tetraethoxysilane
Tetraethoxysilane (CAS: 78-10-4), commonly TEOS, is a silicon alkoxide precursor that hydrolyzes and condenses in the presence of water to form high-purity silica. This colorless liquid serves as the premier precursor for sol-gel silica coatings, silica aerogels, and optical fibers where ultra-high purity and controlled porosity are essential. In semiconductor manufacturing, TEOS enables chemical vapor deposition of silicon dioxide dielectric layers for integrated circuits. The coatings industry employs it for abrasion-resistant sol-gel finishes on glass, plastic, and metal substrates, while the investment casting industry uses silica sols derived from TEOS for precision ceramic shells. It also functions as a cross-linker in silicone systems and as a precursor for mesoporous silica materials in catalysis research. With its controlled reactivity and exceptional purity capabilities, TEOS is fundamental to advanced glass, electronics, and ceramic technologies.
– Sol-Gel Coatings: Used as the silica precursor for scratch-resistant, anti-reflective, and protective coatings on glass, lenses, and display surfaces.
– Semiconductor Manufacturing: Serves as a CVD precursor depositing high-quality silicon dioxide dielectric films in integrated circuit fabrication.
– Investment Casting: Applied in producing stable silica sols for ceramic shell molds in precision metal casting of turbine components.
– Advanced Materials: Employed in synthesizing silica aerogels, mesoporous catalyst supports, and optical fiber preforms.
Product Name: Tetraethoxysilane
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